Southern Analytical process analyzers, process monitors and instrumentation for on-line, in-situ and at-line measurement systems, providing continuous single or multicomponent concentration. Techniques employed include: photometric (use of discrete photometers), spectrophotometric (using full spectrum spectrometer), FTIR (FT-IR), FT-NIR, photodiode array (diode array or PDA) UV/VIS (or alternatively single region NIR, UV or VIS), NIR, Mass Spectrometers, tunable diode laser/lasers (TDL) and more... These systems are applied in: polymer melt monitoring for additives; density and other properties; sulfur (sulphur) recovery unit (SRU) tail gas analyzers (air demand and ratio analyzers); Claus, Modified Claus and Superclaus process plant control; amine based tail gas treaters (TGTUs); low-level moisture analyzers; quality of natural gas for moisture, H2S, hydrocarbon dew point (dewpoint); and, gas, liquid, solids composition analysis. Southern Analytical can provide complete integrated analyzers and process control monitors with sampling systems, analyzer enclosures (wall mounting enclosure, shelter or house) and output for plant process control. We offer analyzers for: H2S (hydrogen sulfide), SO2 (sulfur dioxide), COS, CS2, , NO, NO2, NOx, Cl2 (chlorine), chlorine dioxide, NH3, ammonia, BTX, BTEX, benzene, toluene, xylene, aromatics, CO, CO2, color, Saybolt color, Tag Robinson color, APHA color, ASTM color, ASTM 1500 color, Hazen color, Platinum Cobalt color, Sulfur vapor, total sulfur, MEHQ, TBC, H2O, moisture, HRVOC, VOCs, Oxygen (O2) and trace impurities. Our process analyzers have been used for measurements in Refineries, Power Plants, Chemical and Petrochemical plants for process quality, control, as well as continuous emissions monitoring (CEM or CEMs)...
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Process (On-Line Continuous Analysis) FT-IR and FT-NIR

Matrix-E

Bruker Optics' introduces MATRIX™-E for non-contact diffuse reflectance measurements in precision of FT-NIR.

MATRIX™-E system is developed for performing non-contact analysis of products based on Bruker Optics' R&D 100 Award winner MATRIX™ spectrometer. The system incorporates all the outstanding features of the MATRIX™ including a rugged enclosure, excellent sensitivity and stability, direct methods transfer and support of industry standard communication protocols. The system consists of a standard MATRIX™ spectrometer with a specially designed sampling module, which performs a non-contact diffuse reflectance measurement.

The rugged design of the MATRIX™ allows the system to be oriented in different directions. It can be suspended over the sample (for applications involving conveyor belts) or set up to measure the sample from the side, thus facilitating its integration into production lines.

**Non contact analysis (17 cm distance, up to 50 cm)
**No fiber optic cable assures, No attenuation of signal
**Higher S/N-ratio compared to fiber optic based diffuse reflectance systems
**Compact size, can be mounted on a conveyor belt ( 65 x 36 x 34 cm (w x d x h) and approximately 25 kg)
**Insensitive to vibration and thermal shock
**Connection to DCS via Modbus or 4 to 20 mA enables closed loop control for improved product quality and consistency

The "Emission Module"

The sampling module contains 4 NIR light sources to illuminate the sample. The high throughput optical design allows the user selecting 2 or all 4 sources depending on the reflectivity of the sample, which reduces the heating-up of sensitive samples. Light from the sources is focused on to the sample through a window which serves to protect the optics from the external environment. A computer controlled window cover offers protection when the instrument is not in use and also contains a set of brushes for cleaning the window surface. The window also provides an internal reflectance standard for generating a background spectrum. The optimum distance from the window to the sample is 17 cm and a measurement is also possible in a distance up to 50 cm. The measured spot size is approximately 25 mm in diameter. The collection optics are specially designed such that only diffusely scattered light is collected, thereby providing a more accurate measurement. Variation differences in the distance between the window and the sample does not effect measurements. Thus inhomogeneous samples with large particle sizes can also be measured.

Applications

The MATRIX™-E combines fast non-contact analysis with the sensitivity and precision of FT-NIR. This allows the quick quantification of multiple product components without direct contact with the sample. This opens up a new realm of sampling possibilities for QA/QC and Process applications. The instrument has been successfully utilized for analyzing moisture content in paper, coatings in textiles, various components in wood products, polymers and pharmaceuticals.

Easy Maintenance

Fourier Transform allows higher resolution, better sensitivity, higher wavelength accuracy and easy calibration transfer from one instrument to another.

Maintenance of the system is simple, since all consumable electronic components (such as the laser and the source) are on pre-aligned mounts for quick exchange. Furthermore, these components are located in a different compartment from the optical components (such as the interferometer and focusing mirrors). This allows repairs and replacements to be carried out without accessing the environmentally sensitive optics area.

MATRIX™-E can be controlled by Bruker Optics' OPUS software package on Microsoft® Windows NT and Windows 2000 operating systems. On-line diagnostics tests monitor the status of the electronic and optical components and advise the user of a failure. The "Instrument Test", which forms a part of the Performance Qualification (PQ) of the instrument, can be used to verify the performance of the instrument periodically. These features allow the instrument to be serviced quickly thereby avoiding long down times.

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